Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/10880
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dc.contributor.authorMUKHERJEE, NILANJANAen_US
dc.contributor.authorMAJUMDAR, MOUMITAen_US
dc.date.accessioned2026-04-17T11:11:51Z
dc.date.available2026-04-17T11:11:51Z
dc.date.issued2026-03en_US
dc.identifier.citationOrganometallics, 45(06).en_US
dc.identifier.issn0276-7333en_US
dc.identifier.issn1520-6041en_US
dc.identifier.urihttps://doi.org/10.1021/acs.organomet.6c00026en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/10880
dc.description.abstractThe redox-active nature of the bis(imino)acenaphthene (BIAN) ligand enabled the formation of [(dipp-BIAN)TeCl2] (dipp = 2,6-diisopropylphenyl), compound 1, via two-electron transfer from the dianionic BIAN ligand to TeCl4, resulting in reduction of Te(IV) to Te(II). Treatment of 1 with 2 and 3 equiv of AgSbF6 resulted in the formation of Te(II) mono- and dicationic compounds 2 and 3, respectively. The effective Lewis acidity of compound 3 was assessed using the Gutmann–Beckett method. Reaction of 3 with Ph3PO afforded compound 4, featuring coordination of two Ph3PO units at the Te(II) dicationic center. Compound 3 was employed as a proof-of-concept Lewis acid catalyst for the hydrosilylation of p-methyl benzaldehyde. All the compounds were characterized using single-crystal X-ray diffraction, multinuclear nuclear magnetic resonance (NMR) spectroscopy, mass spectrometry, and absorbance spectroscopy.en_US
dc.language.isoenen_US
dc.publisherAmerican Chemical Societyen_US
dc.subjectAcidityen_US
dc.subjectGroup 16 compoundsen_US
dc.subjectLigandsen_US
dc.subjectNuclear magnetic resonance spectroscopyen_US
dc.subjectTelluriumen_US
dc.subject2026-APR-WEEK2en_US
dc.subjectTOC-APR-2026en_US
dc.subject2026en_US
dc.titleLigand-Centered Redox-Assisted Synthesis of a Bis(imino)acenaphthene-Stabilized Tellurium(II) Dicationic Compounden_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Chemistryen_US
dc.identifier.sourcetitleOrganometallicsen_US
dc.publication.originofpublisherForeignen_US
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