Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/1180
Title: Gate-dependent vacancy diffusion in graphene
Authors: BABAR, ROHIT
KABIR, MUKUL
Dept. of Physics
Keywords: Logarithmic resistance correction
Point-defects
Ion-irradiation
Stability
Graphite
Dynamics
TOC-SEP-2018
Dislocation
Coalescence
Scattering
2018
Issue Date: Aug-2018
Publisher: American Physical Society
Citation: Physical Review B. Vol.98(7).
Abstract: The kinetics of vacancy defect in graphene drives structural modifications leading to disorder, multivacancy complex, and edge reconstruction. Within the first-principles calculations, we study the dynamic Jahn-Teller distortion and diffusion of a vacancy defect. Further, the intricate dependence of carrier doping is systematically investigated. The experimental observation of dynamic Jahn-Teller distortion is argued to be blocked by defect functionalization and charge doping. We demonstrate that lattice relaxation perpendicular to the graphene sheet along with the in-plane strain relaxation play predominant roles in predicting the correct microscopic mechanism for vacancy diffusion. The importance of quantum correction to the classical barrier is discussed. The calculated activation barrier increases upon both electron and hole doping and the observed trends are explained by the differential charge density distribution and hardening of the responsible low-energy phonon modes. Electron doping essentially freezes the vacancy motion, and thus any degradation mediated by it. While tracking and analyzing the vacancy diffusion experimentally in graphene is a difficult task, the present results will motivate new experimental efforts and assist interpretation of the results.
URI: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/1180
https://doi.org/10.1103/PhysRevB.98.075439
ISSN: 2469-9969
Appears in Collections:JOURNAL ARTICLES

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