Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/1980
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dc.contributor.authorGokhale, Shubhaen_US
dc.contributor.authorLamba, Subhalakshmien_US
dc.contributor.authorKumari, Nehaen_US
dc.contributor.authorSingh, Bhupendraen_US
dc.contributor.authorAvasthi, D. K.en_US
dc.contributor.authorKULKARNI, SULABHAen_US
dc.date.accessioned2019-02-25T09:02:42Z
dc.date.available2019-02-25T09:02:42Z
dc.date.issued2014-08en_US
dc.identifier.citationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 333, 64-68.en_US
dc.identifier.issn0168-583Xen_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/1980-
dc.identifier.urihttps://doi.org/10.1016/j.nimb.2014.04.020en_US
dc.description.abstractMagnetite (Fe3O4) nanospheres of ∼8–11 nm diameter synthesized using a chemical co-precipitation method were deposited as thin films on different substrates using spin coating. The thin films were irradiated with Ag ions at 100 MeV energy. Comparison of unirradiated, as synthesized Fe3O4 nanoparticulate thin film and ion irradiated film shows that irradiation causes dramatic changes in the morphology, structure and magnetic properties. Monte Carlo simulations carried out on this system indicate that the origin of the changes in the magnetic properties lies in the enhanced magnetic anisotropy energy density and reorientation of magnetic easy axis.en_US
dc.language.isoenen_US
dc.publisherElsevier B.V.en_US
dc.subjectMagnetite nanoparticlesen_US
dc.subjectSHI induced modificationsen_US
dc.subjectMagnetic anisotropyen_US
dc.subjectSwift heavy ion irradiationen_US
dc.subject2014en_US
dc.titleModifying the morphology and magnetic properties of magnetite nanoparticles using swift heavy ion irradiationen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Physicsen_US
dc.identifier.sourcetitleNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atomsen_US
dc.publication.originofpublisherForeignen_US
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