Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/2527
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dc.contributor.authorJAGADEESWARARAO, METIKOTIen_US
dc.contributor.authorPal, Somnathen_US
dc.contributor.authorNAG, ANGSHUMANen_US
dc.date.accessioned2019-04-26T09:13:54Z
dc.date.available2019-04-26T09:13:54Z
dc.date.issued2016-03en_US
dc.identifier.citationChemPhysChem,17(5), 710-716.en_US
dc.identifier.issn1439-4235en_US
dc.identifier.issn1439-7641en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/2527-
dc.identifier.urihttps://doi.org/10.1002/cphc.201500973en_US
dc.description.abstractSn4+‐doped In2O3 (ITO) is a benchmark transparent conducting oxide material. We prepared ligand‐free but colloidal ITO (8 nm, 10 % Sn4+) nanocrystals (NCs) by using a post‐synthesis surface‐modification reaction. (CH3)3OBF4 removes the native oleylamine ligand from NC surfaces to give ligand‐free, positively charged NCs that form a colloidal dispersion in polar solvents. Both oleylamine‐capped and ligand‐free ITO NCs exhibit intense absorption peaks, due to localized surface plasmon resonance (LSPR) at around λ=1950 nm. Compared with oleylamine‐capped NCs, the electrical resistivity of ligand‐free ITO NCs is lower by an order of magnitude (≈35 mΩ cm−1). Resistivity over a wide range of temperatures can be consistently described as a composite of metallic ITO grains embedded in an insulating matrix by using a simple equivalent circuit, which provides an insight into the conduction mechanism in these systems.en_US
dc.language.isoenen_US
dc.publisherWileyen_US
dc.subjectElectrical and Plasmonic Propertiesen_US
dc.subjectDoped In2O3en_US
dc.subjectITO Nanocrystalsen_US
dc.subjectDoping transition metalen_US
dc.subject2016en_US
dc.titleElectrical and Plasmonic Properties of Ligand‐Free Sn4+‐Doped In2O3 (ITO) Nanocrystalsen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Chemistryen_US
dc.identifier.sourcetitleChemPhysChemen_US
dc.publication.originofpublisherForeignen_US
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