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http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308
Title: | Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists |
Authors: | BALLAV, NIRMALYA Terfort, Andreas Zharnikov, Michael Dept. of Chemistry |
Keywords: | EBCL using irradiation Promoted exchange reaction Electron-beam Activation lithography Direct writing Chemical lithography 2012 |
Issue Date: | Jun-2012 |
Publisher: | Wiley |
Citation: | Soft Matter Gradient Surfaces: Methods and Applications |
URI: | http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308 |
ISSN: | 9781118166086 9780470522653 |
Appears in Collections: | BOOK CHAPTERS |
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