Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308
Title: Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists
Authors: BALLAV, NIRMALYA
Terfort, Andreas
Zharnikov, Michael
Dept. of Chemistry
Keywords: EBCL using irradiation
Promoted exchange reaction
Electron-beam
Activation lithography
Direct writing
Chemical lithography
2012
Issue Date: Jun-2012
Publisher: Wiley
Citation: Soft Matter Gradient Surfaces: Methods and Applications
URI: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308
ISSN: 9781118166086
9780470522653
Appears in Collections:BOOK CHAPTERS

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