Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists

Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308

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DC Field	Value	Language
dc.contributor.author	BALLAV, NIRMALYA	en_US
dc.contributor.author	Terfort, Andreas	en_US
dc.contributor.author	Zharnikov, Michael	en_US
dc.date.accessioned	2019-12-24T12:30:57Z
dc.date.available	2019-12-24T12:30:57Z
dc.date.issued	2012-06	en_US
dc.identifier.citation	Soft Matter Gradient Surfaces: Methods and Applications	en_US
dc.identifier.issn	9781118166086	en_US
dc.identifier.issn	9780470522653	en_US
dc.identifier.uri	http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308	-
dc.language.iso	en	en_US
dc.publisher	Wiley	en_US
dc.subject	EBCL using irradiation	en_US
dc.subject	Promoted exchange reaction	en_US
dc.subject	Electron-beam	en_US
dc.subject	Activation lithography	en_US
dc.subject	Direct writing	en_US
dc.subject	Chemical lithography	en_US
dc.subject	2012	en_US
dc.title	Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists	en_US
dc.type	Book chapter	en_US
dc.contributor.department	Dept. of Chemistry	en_US
dc.identifier.doi	https://doi.org/10.1002/9781118166086.ch8	en_US
dc.publication.originofpublisher	Foreign	en_US
Appears in Collections:	BOOK CHAPTERS

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