Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/5102
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dc.contributor.authorMarathe, Sonalien_US
dc.contributor.authorKoinkar, Pankajen_US
dc.contributor.authorAshtaputre, Shriwasen_US
dc.contributor.authorSathe, Vasanten_US
dc.contributor.authorMore, M. Aen_US
dc.contributor.authorKULKARNI, SULABHAen_US
dc.date.accessioned2020-10-13T09:55:03Z
dc.date.available2020-10-13T09:55:03Z
dc.date.issued2010-05en_US
dc.identifier.citationThin Solid Films, 518(14), 3743-3747.en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/5102-
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2009.10.118en_US
dc.description.abstractZnO nanoneedles were coated on hot filament chemical vapour deposited diamond thin films to enhance the field emission properties of ZnO nanoneedles. The virgin diamond films and ZnO nanoneedles on diamond films were characterized using scanning electron microscopy, X-ray photoelectron spectroscopy and Raman spectroscopy. The field emission studies reveal that the ZnO nanoneedles coated on diamond film exhibit better emission characteristics, with minimum threshold field (required to draw a current density ~ 1 μA/cm2) as compared to ZnO needles on silicon and virgin diamond films. The better emission characteristic of ZnO nanoneedles on diamond film is attributed to the high field-enhancement factor resulting due to the combined effect of the ZnO nanoneedles and diamond film.en_US
dc.language.isoenen_US
dc.publisherElsevier B.V.en_US
dc.subjectField emissionen_US
dc.subjectZinc oxideen_US
dc.subjectDiamond thin filmen_US
dc.subjectField-enhancement factoren_US
dc.subjectX-ray photoelectron spectroscopyen_US
dc.subjectRaman spectroscopyen_US
dc.subjectChemical depositionen_US
dc.subject2010en_US
dc.titleEnhanced field emission from ZnO nanoneedles on chemical vapour deposited diamond filmsen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Physicsen_US
dc.identifier.sourcetitleThin Solid Filmsen_US
dc.publication.originofpublisherForeignen_US
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