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dc.contributor.authorAlaboson, Justice M. P.en_US
dc.contributor.authorDESHPANDE, APARNA et al.en_US
dc.date.accessioned2020-10-19T08:59:37Z-
dc.date.available2020-10-19T08:59:37Z-
dc.date.issued2013-03en_US
dc.identifier.citationNano Letters, 13(12), 5763-5770.en_US
dc.identifier.issn1530-6984en_US
dc.identifier.issn1530-6992en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/5176-
dc.identifier.urihttps://doi.org/10.1021/nl4000932en_US
dc.description.abstractMolecular-scale control over the integration of disparate materials on graphene is a critical step in the development of graphene-based electronics and sensors. Here, we report that self-assembled monolayers of 10,12-pentacosadiynoic acid (PCDA) on epitaxial graphene can be used to template the reaction and directed growth of atomic layer deposited (ALD) oxide nanostructures with sub-10 nm lateral resolution. PCDA spontaneously assembles into well-ordered domains consisting of one-dimensional molecular chains that coat the entire graphene surface in a manner consistent with the symmetry of the underlying graphene lattice. Subsequently, zinc oxide and alumina ALD precursors are shown to preferentially react with the functional moieties of PCDA, resulting in templated oxide nanostructures. The retention of the original one-dimensional molecular ordering following ALD is dependent on the chemical reaction pathway and the stability of the monolayer, which can be enhanced via ultraviolet-induced molecular cross-linking.en_US
dc.language.isoenen_US
dc.publisherAmerican Chemical Societyen_US
dc.subjectEpitaxial graphemeen_US
dc.subjectSilicon carbideen_US
dc.subjectPentacosadiynoic aciden_US
dc.subjectALD|Zinc oxideen_US
dc.subjectAluminaen_US
dc.subject2013en_US
dc.titleTemplating Sub-10 nm Atomic Layer Deposited Oxide Nanostructures on Graphene via One-Dimensional Organic Self-Assembled Monolayersen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Physicsen_US
dc.identifier.sourcetitleNano Lettersen_US
dc.publication.originofpublisherForeignen_US
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