Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/5557
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dc.contributor.authorGHOSH, MOUSHAKHIen_US
dc.contributor.authorPANWARIA, PRAKASHen_US
dc.contributor.authorTothadi, Srinuen_US
dc.contributor.authorDAS, ALOKEen_US
dc.contributor.authorKHAN, SHABANAen_US
dc.date.accessioned2021-01-25T04:44:57Z
dc.date.available2021-01-25T04:44:57Z
dc.date.issued2020-12en_US
dc.identifier.citationInorganic Chemistry, 59(23), 17811–17821.en_US
dc.identifier.issn0020-1669en_US
dc.identifier.issn1520-510Xen_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/5557
dc.identifier.urihttps://doi.org/10.1021/acs.inorgchem.0c03098en_US
dc.description.abstractHerein, we report the synthesis of a series of bis(silanechalcogenones) [Ch = Te (2), S (3), or Se (4)] using an N-heterocyclic silylene-based SiCSi pincer ligand (1). 2 is the first example of a bis(silanetellurone) derivative. The bonding patterns of 2–4 were extensively studied by natural bond orbital, quantum theory of atoms in molecules, and noncovalent interaction index analyses, and these exhibit weak C–H···Ch interaction. The analogous reaction of 1 with trimethyl N-oxide produced a novel bis(cyclosiloxane) derivative (5). All of the complexes are duly characterized by single-crystal X-ray diffraction studies, multinuclear nuclear magnetic resonance (1H, 13C, and 29Si) spectroscopy, and high-resolution mass spectrometry.en_US
dc.language.isoenen_US
dc.publisherAmerican Chemical Societyen_US
dc.subjectHydrogen-Bondsen_US
dc.subjectCombined NMRen_US
dc.subjectSEen_US
dc.subjectSeriesen_US
dc.subjectCoordinationen_US
dc.subjectThioestersen_US
dc.subjectChalcogensen_US
dc.subjectComplexesen_US
dc.subjectTelluriumen_US
dc.subjectMoleculesen_US
dc.subject2021-JAN-WEEK3en_US
dc.subjectTOC-JAN-2021en_US
dc.subject2020en_US
dc.titleBis(silanetellurone) with C–H···Te Interactionen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Chemistryen_US
dc.identifier.sourcetitleInorganic Chemistryen_US
dc.publication.originofpublisherForeignen_US
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