Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8078
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dc.contributor.authorSINDHU, POOJAen_US
dc.contributor.authorBALLAV, NIRMALYAen_US
dc.date.accessioned2023-07-21T10:38:05Z
dc.date.available2023-07-21T10:38:05Z
dc.date.issued2023-07en_US
dc.identifier.citationInorganic Chemistry, 62(28), 10887–10891.en_US
dc.identifier.issn0020-1669en_US
dc.identifier.issn1520-510Xen_US
dc.identifier.urihttps://doi.org/10.1021/acs.inorgchem.3c01489en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8078
dc.description.abstractDepositing thin films of pristine metal–organic framework (MOF) on top of a lattice-matched and molecularly doped MOF could provide a new path for generating electronic heterostructures of MOFs with well-defined interfaces. Herein, the Cu3BTC2 (top-layer)/TCNQ@Cu3BTC2 (bottom-layer) system is fabricated by sequential deposition on a functionalized Au substrate, and clear-cut rectification of electrical current across the thin film was observed at room-temperature. Interestingly, the electrical current rectification ratio (RR) was found to be significantly influenced by the effect of temperature (400 K), resulting in a remarkable figure in the domain of MOFs.en_US
dc.language.isoenen_US
dc.publisherAmerican Chemical Societyen_US
dc.subjectDopingen_US
dc.subjectElectrical conductivityen_US
dc.subjectLayersen_US
dc.subjectMetal organic frameworksen_US
dc.subjectThin filmsen_US
dc.subject2023-JUL-WEEK2en_US
dc.subjectTOC-JUL-2023en_US
dc.subject2023en_US
dc.titleThin Films of MOF-on-Guest@MOF: A Simple Strategy of Designing Electronic Heterostructuresen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Chemistryen_US
dc.identifier.sourcetitleInorganic Chemistryen_US
dc.publication.originofpublisherForeignen_US
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