Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8713
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dc.contributor.authorPal, Sukanyaen_US
dc.contributor.authorSinha, Arijiten_US
dc.contributor.authorHARNAGEA, LUMINITAen_US
dc.contributor.authorTELANG, PRACHIen_US
dc.contributor.authorMuthu, D. V. S.en_US
dc.contributor.authorWaghmare, U. V.en_US
dc.contributor.authorSood, A. K.en_US
dc.date.accessioned2024-04-24T05:45:27Z
dc.date.available2024-04-24T05:45:27Z
dc.date.issued2024-04en_US
dc.identifier.citationPhysical Review B, 109(15), 155202en_US
dc.identifier.issn2469-9969en_US
dc.identifier.issn2469-9950en_US
dc.identifier.urihttps://doi.org/10.1103/PhysRevB.109.155202en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8713
dc.description.abstractTa2NiS5, a semiconductor at ambient conditions, does not exhibit an excitonic insulating state like its selenium counterpart Ta2NiSe5, owing to its large band gap. Using a combination of Raman spectroscopy and analysis with first-principles effective Hamiltonian, we explore its instability toward an excitonic insulating state as a function of pressure, and affirm that excitonic insulating state does not get stabilized in Ta2NiS5 with pressure. We observe pressure-induced structural phase transition from its orthorhombic Cmcm structure to another orthorhombic Pmnm structure, with onset at ∼ 4.2 GPa and this transition gets completed at ∼ 6 GPa. We observe Raman signatures of an additional phase transition at ∼ 10.8 GPa, which is suggested to be associated with a semiconductor to metal transitionen_US
dc.language.isoenen_US
dc.publisherAmerican Physical Societyen_US
dc.subjectPhysicsen_US
dc.subjectTOC-APR-2024en_US
dc.subject2024en_US
dc.subject2024-APR-WEEK2en_US
dc.subjectTOC-APR-2024en_US
dc.titlePressure-dependent excitonic instability and structural phase transition in Ta2NiS5: Raman and first-principles studyen_US
dc.typeArticleen_US
dc.contributor.departmentDept. of Physicsen_US
dc.identifier.sourcetitlePhysical Review Ben_US
dc.publication.originofpublisherForeignen_US
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