Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8926
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dc.contributor.advisorBALLAV, NIRMALYA-
dc.contributor.authorMAHATTAM, ANIRUDDHA-
dc.date.accessioned2024-05-21T06:12:02Z-
dc.date.available2024-05-21T06:12:02Z-
dc.date.issued2024-05-
dc.identifier.citation22en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8926-
dc.description.abstractImparting electrical conductivity into metal-organic frameworks (MOF) having a significantly high porous nature, and large surface area but extremely poor electrical conductivity opens doors for numerous applications of MOFs in electronics, optoelectronics, and supercapacitors. Using molecular iodine as a guest in the MOFs is an effective strategy for enhancing electrical conductivity. Herein, we demonstrate for the first-time fabrication of Cu-NDC thin film using an electrochemical deposition approach and thereby intercalation of molecular iodine into MOF thin film. The iodine-doped thin film resulted in nearly ~2 orders of magnitude increased electrical Conductance than the pristine thin film. The increased electrical performance can be attributed to the formation of I3¯ species due to the partial oxidation of the framework. Consequences as mentioned earlier make the molecular iodine doping strategy, a promising candidate for modulating the electrical conductivity of MOFsen_US
dc.language.isoen_USen_US
dc.subjectMOFen_US
dc.subjectIodine dopingen_US
dc.subjectEnhanced electrical conductivityen_US
dc.titleIodine-Induced Enhancement in Electrical Conductivity of Electrodeposited Thin Film of Copper-Carboxylate MOFen_US
dc.typeThesisen_US
dc.description.embargoOne Yearen_US
dc.type.degreeMSc.en_US
dc.contributor.departmentDept. of Chemistryen_US
dc.contributor.registration20226209en_US
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