Please use this identifier to cite or link to this item: http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/9560
Title: Intertwining of Localized (d) and Delocalized (π) Spins in Magnetically Frustrated Two-Dimensional Metal–Organic Frameworks
Authors: UGALE, AJAY
NINAWE, PRANAY
Jain, Anil
Sangole, Mayur
MANDAL, RIMPA
Singh, Kirandeep
BALLAV, NIRMALYA
Dept. of Chemistry
Keywords: Chemistry
Crystals
State
Layer
2024
Issue Date: Feb-2024
Publisher: American Chemical Society
Citation: Inorganic Chemistry, 63(08), 3675–3681.
Abstract: Two-dimensional metal–organic frameworks (2D MOFs) are emerging as a new class of multifunctional materials for diversified applications, although magnetic properties have not been widely explored. The metal ions and organic ligands in some of the 2D MOFs are arranged in the well-known Kagome lattice, leading to geometric spin frustration. Hence, such systems could be the potential candidates to exhibit an exotic quantum spin liquid (QSL) state, as was observed in Cu3(HHTP)2 (HHTP = hexahydroxytriphenylene), with no magnetic transition down to 38 mK. Hereto, we have investigated the spin intertwining in a bimetallic 2D MOF system, M3(HHTP)2 (M = Cu/Zn), arising from the localized (d-electron) and delocalized (π-electron) S = 1/2 spins from the Cu(II) ions and the HHTP radicals, respectively. The origin of the spin frustration (down to 5K) was critically examined by varying the metal composition in bimetallic systems, CuxZn3–x(HHTP)2 (x = 1, 1.5, 2), containing both S = 1/2 and S = 0 spins. Additionally, to gain a deeper understanding, we studied the spin interaction in the pristine Zn3(HHTP)2 system containing only S = 0 Zn(II) ions. In view of the quantitative estimate of the localized and delocalized spins, the d−π spin correlation appears essential in understanding the unusual magnetic and/or other physical properties of such hybrid organic–inorganic 2D crystalline solids
URI: https://doi.org/10.1021/acs.inorgchem.3c03247
http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/9560
ISSN: 0020-1669
1520-510X
Appears in Collections:JOURNAL ARTICLES

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