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Gate-dependent vacancy diffusion in graphene

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dc.contributor.author BABAR, ROHIT en_US
dc.contributor.author KABIR, MUKUL en_US
dc.date.accessioned 2018-10-04T03:54:06Z
dc.date.available 2018-10-04T03:54:06Z
dc.date.issued 2018-08 en_US
dc.identifier.citation Physical Review B. Vol.98(7). en_US
dc.identifier.issn 2469-9969 en_US
dc.identifier.uri http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/1180
dc.identifier.uri https://doi.org/10.1103/PhysRevB.98.075439 en_US
dc.description.abstract The kinetics of vacancy defect in graphene drives structural modifications leading to disorder, multivacancy complex, and edge reconstruction. Within the first-principles calculations, we study the dynamic Jahn-Teller distortion and diffusion of a vacancy defect. Further, the intricate dependence of carrier doping is systematically investigated. The experimental observation of dynamic Jahn-Teller distortion is argued to be blocked by defect functionalization and charge doping. We demonstrate that lattice relaxation perpendicular to the graphene sheet along with the in-plane strain relaxation play predominant roles in predicting the correct microscopic mechanism for vacancy diffusion. The importance of quantum correction to the classical barrier is discussed. The calculated activation barrier increases upon both electron and hole doping and the observed trends are explained by the differential charge density distribution and hardening of the responsible low-energy phonon modes. Electron doping essentially freezes the vacancy motion, and thus any degradation mediated by it. While tracking and analyzing the vacancy diffusion experimentally in graphene is a difficult task, the present results will motivate new experimental efforts and assist interpretation of the results. en_US
dc.language.iso en en_US
dc.publisher American Physical Society en_US
dc.subject Logarithmic resistance correction en_US
dc.subject Point-defects en_US
dc.subject Ion-irradiation en_US
dc.subject Stability en_US
dc.subject Graphite en_US
dc.subject Dynamics en_US
dc.subject TOC-SEP-2018 en_US
dc.subject Dislocation en_US
dc.subject Coalescence en_US
dc.subject Scattering en_US
dc.subject 2018 en_US
dc.title Gate-dependent vacancy diffusion in graphene en_US
dc.type Article en_US
dc.contributor.department Dept. of Physics en_US
dc.identifier.sourcetitle Physical Review B en_US
dc.publication.originofpublisher Foreign en_US


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