dc.contributor.author |
JAGADEESWARARAO, METIKOTI |
en_US |
dc.contributor.author |
Pal, Somnath |
en_US |
dc.contributor.author |
NAG, ANGSHUMAN |
en_US |
dc.date.accessioned |
2019-04-26T09:13:54Z |
|
dc.date.available |
2019-04-26T09:13:54Z |
|
dc.date.issued |
2016-03 |
en_US |
dc.identifier.citation |
ChemPhysChem,17(5), 710-716. |
en_US |
dc.identifier.issn |
1439-4235 |
en_US |
dc.identifier.issn |
1439-7641 |
en_US |
dc.identifier.uri |
http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/2527 |
|
dc.identifier.uri |
https://doi.org/10.1002/cphc.201500973 |
en_US |
dc.description.abstract |
Sn4+‐doped In2O3 (ITO) is a benchmark transparent conducting oxide material. We prepared ligand‐free but colloidal ITO (8 nm, 10 % Sn4+) nanocrystals (NCs) by using a post‐synthesis surface‐modification reaction. (CH3)3OBF4 removes the native oleylamine ligand from NC surfaces to give ligand‐free, positively charged NCs that form a colloidal dispersion in polar solvents. Both oleylamine‐capped and ligand‐free ITO NCs exhibit intense absorption peaks, due to localized surface plasmon resonance (LSPR) at around λ=1950 nm. Compared with oleylamine‐capped NCs, the electrical resistivity of ligand‐free ITO NCs is lower by an order of magnitude (≈35 mΩ cm−1). Resistivity over a wide range of temperatures can be consistently described as a composite of metallic ITO grains embedded in an insulating matrix by using a simple equivalent circuit, which provides an insight into the conduction mechanism in these systems. |
en_US |
dc.language.iso |
en |
en_US |
dc.publisher |
Wiley |
en_US |
dc.subject |
Electrical and Plasmonic Properties |
en_US |
dc.subject |
Doped In2O3 |
en_US |
dc.subject |
ITO Nanocrystals |
en_US |
dc.subject |
Doping transition metal |
en_US |
dc.subject |
2016 |
en_US |
dc.title |
Electrical and Plasmonic Properties of Ligand‐Free Sn4+‐Doped In2O3 (ITO) Nanocrystals |
en_US |
dc.type |
Article |
en_US |
dc.contributor.department |
Dept. of Chemistry |
en_US |
dc.identifier.sourcetitle |
ChemPhysChem |
en_US |
dc.publication.originofpublisher |
Foreign |
en_US |