MAJUMDER, SUDIPTA; CHAND, RAHUL; H L, PRADEEPA; BASU, MEGHASREE; MAHAPATRA, AVINASH; VERMA, SWETA; CHATTERJEE, SAGNIK; SHUKLA, ASHUTOSH; Watanabe, Kenji; Taniguchi, Takashi; KUMAR, G. V. PAVAN; RAHMAN, ATIKUR
(American Chemical Society, 2026-04)
The integration of van der Waals (vdW) materials, especially those grown by chemical vapor deposition (CVD), is often hindered by interfacial contamination, bubble formation, and chemical damage during transfer. Here, we ...