dc.contributor.advisor |
BALLAV, NIRMALYA |
|
dc.contributor.author |
MAHATTAM, ANIRUDDHA |
|
dc.date.accessioned |
2024-05-21T06:12:02Z |
|
dc.date.available |
2024-05-21T06:12:02Z |
|
dc.date.issued |
2024-05 |
|
dc.identifier.citation |
22 |
en_US |
dc.identifier.uri |
http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8926 |
|
dc.description.abstract |
Imparting electrical conductivity into metal-organic frameworks (MOF) having a significantly high porous nature, and large surface area but extremely poor electrical conductivity opens doors for numerous applications of MOFs in electronics, optoelectronics, and supercapacitors. Using molecular iodine as a guest in the MOFs is an effective strategy for enhancing electrical conductivity. Herein, we demonstrate for the first-time fabrication of Cu-NDC thin film using an electrochemical deposition approach and thereby intercalation of molecular iodine into MOF thin film. The iodine-doped thin film resulted in nearly ~2 orders of magnitude increased electrical Conductance than the pristine thin film. The increased electrical performance can be attributed to the formation of I3¯ species due to the partial oxidation of the framework. Consequences as mentioned earlier make the molecular iodine doping strategy, a promising candidate for modulating the electrical conductivity of MOFs |
en_US |
dc.language.iso |
en_US |
en_US |
dc.subject |
MOF |
en_US |
dc.subject |
Iodine doping |
en_US |
dc.subject |
Enhanced electrical conductivity |
en_US |
dc.title |
Iodine-Induced Enhancement in Electrical Conductivity of Electrodeposited Thin Film of Copper-Carboxylate MOF |
en_US |
dc.type |
Thesis |
en_US |
dc.description.embargo |
One Year |
en_US |
dc.type.degree |
MSc. |
en_US |
dc.contributor.department |
Dept. of Chemistry |
en_US |
dc.contributor.registration |
20226209 |
en_US |