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From Pixels to Nanometers: Integrating Machine Learning and Mechatronics for Photolithography Automation with a Focus on 2D Materials

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dc.contributor.advisor RAHMAN, ATIKUR
dc.contributor.author RAO, RAVI PRAKASH
dc.date.accessioned 2024-05-31T11:25:21Z
dc.date.available 2024-05-31T11:25:21Z
dc.date.issued 2024-05
dc.identifier.citation 61 en_US
dc.identifier.uri http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8972
dc.description.abstract We have tried to optimize the growth parameters of the CVD growth of Bi2O2Se on various substrates, focusing on f-mica. Also, exploring the various techniques of Photolithography to signify the vital role it plays in 2D material research. Moreover, we have proposed and designed an Automated Maskless Photolithography setup by modifying the existing Photolithography setup with merely Stepper Motors, Raspberry Pi, Arduino, A camera and a DLP. en_US
dc.language.iso en en_US
dc.subject 2D Materials en_US
dc.subject Photolithography en_US
dc.subject Bismuth Oxyselenide en_US
dc.title From Pixels to Nanometers: Integrating Machine Learning and Mechatronics for Photolithography Automation with a Focus on 2D Materials en_US
dc.type Thesis en_US
dc.description.embargo No Embargo en_US
dc.type.degree BS-MS en_US
dc.contributor.department Dept. of Physics en_US
dc.contributor.registration 20181127 en_US


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  • MS THESES [1705]
    Thesis submitted to IISER Pune in partial fulfilment of the requirements for the BS-MS Dual Degree Programme/MSc. Programme/MS-Exit Programme

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